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Influence of krypton atoms on the structure of amorphous hydrogenated carbon deposited by plasma enhanced chemical vapor deposition

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Influence of krypton atoms on the structure of amorphous hydrogenated carbon deposited by plasma enhanced chemical vapor deposition

dc.contributor.author	Oliveira, M.H., Jr.
dc.contributor.author	Viana, G.A.
dc.contributor.author	Morais de Lima, Mauricio, Jr.
dc.contributor.author	Cros Stotter, Ana
dc.contributor.author	Cantarero Sáez, Andrés
dc.contributor.author	Marques, F.C.
dc.date.accessioned	2013-11-28T13:06:55Z
dc.date.available	2013-11-28T13:06:55Z
dc.date.issued	2010
dc.identifier.citation	Oliveira, M.H., Jr. Viana, G.A. Morais de Lima, Mauricio, Jr. Cros Stötter, Ana Cantarero Sáez, Andrés Marques, F.C. 2010 Influence of krypton atoms on the structure of amorphous hydrogenated carbon deposited by plasma enhanced chemical vapor deposition Journal of Applied Physics 108 12 123525
dc.identifier.uri	http://hdl.handle.net/10550/31483
dc.description.abstract	Hydrogenated amorphous carbon (a-C:H) films were prepared by plasma enhanced chemical vapor deposition using methane (CH4 ) plus krypton (Kr) mixed atmosphere. The depositions were performed as function of the bias voltage and krypton partial pressure. The goal of this work was to study the influence of krypton gas on the physical properties of a-C:H films deposited on the cathode electrode. Krypton concentration up to 1.6 at. %, determined by Rutherford Back-Scattering, was obtained at high Kr partial pressure and bias of -120 V. The structure of the films was analyzed by means of optical transmission spectroscopy, multi-wavelength Raman scattering and Fourier Transform Infrared spectroscopy. It was verified that the structure of the films remains unchanged up to a concentration of Kr of about 1.0 at. %. A slight graphitization of the films occurs for higher concentration. The observed variation in the film structure, optical band gap, stress, and hydrogen concentration were associated mainly with the subplantation process of hydrocarbons radicals, rather than the krypton ion energy.
dc.relation.ispartof	Journal of Applied Physics, 2010, vol. 108, num. 12, p. 123525
dc.subject	Espectroscòpia Raman
dc.subject	Carbó
dc.subject	Ciència dels materials
dc.subject	Espectroscòpia infraroja de transformada de Fourier
dc.title	Influence of krypton atoms on the structure of amorphous hydrogenated carbon deposited by plasma enhanced chemical vapor deposition
dc.type	journal article	es_ES
dc.date.updated	2013-11-28T13:06:55Z
dc.identifier.doi	10.1063/1.3526000
dc.identifier.idgrec	061139
dc.rights.accessRights	open access	es_ES
dc.identifier.url	10.1063/1.3526000