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Integrated cleanroom process for the vapor-phase deposition of large-area zeolitic imidazolate framework thin films

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Integrated cleanroom process for the vapor-phase deposition of large-area zeolitic imidazolate framework thin films

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dc.contributor.author	Cruz, Alexander John
dc.contributor.author	Stassen, Ivo
dc.contributor.author	Krishtab, Mikhail
dc.contributor.author	Marcoen, Kristof
dc.contributor.author	Stassin, Timothée
dc.contributor.author	Rodríguez-Hermida, Sabina
dc.contributor.author	Teyssandier, Joan
dc.contributor.author	Pletincx, Sven
dc.contributor.author	Verbeke, Rhea
dc.contributor.author	Rubio-Giménez, Víctor
dc.contributor.author	Tatay Aguilar, Sergio
dc.contributor.author	Martí Gastaldo, Carlos
dc.contributor.author	Meersschaut, Johan
dc.contributor.author	Vereecken, Philippe M.
dc.contributor.author	De Feyter, Steven
dc.contributor.author	Hauffman, Tom
dc.contributor.author	Ameloot, Rob
dc.date.accessioned	2020-05-04T10:36:52Z
dc.date.available	2020-05-04T10:36:52Z
dc.date.issued	2019
dc.identifier.citation	Cruz, Alexander John Stassen, Ivo Krishtab, Mikhail Marcoen, Kristof Stassin, Timothée Rodríguez-Hermida, Sabina Teyssandier, Joan Pletincx, Sven Verbeke, Rhea Rubio-Giménez, Víctor Tatay Aguilar, Sergio Martí Gastaldo, Carlos Meersschaut, Johan Vereecken, Philippe M. De Feyter, Steven Hauffman, Tom Ameloot, Rob 2019 Integrated cleanroom process for the vapor-phase deposition of large-area zeolitic imidazolate framework thin films Chemistry of Materials 31 22 9462 9471
dc.identifier.uri	https://hdl.handle.net/10550/74201
dc.description.abstract	Robust and scalable thin-film deposition methods are key to realize the potential of metal-organic frameworks (MOFs) in electronic devices. Here, we report the first integration of the chemical vapor deposition (CVD) of MOF coatings in a custom reactor within a cleanroom setting. As a test case, the MOF-CVD conditions for the zeolitic imidazolate framework-8 are optimized to enable smooth, pinhole-free, and uniform thin films on full 200 mm wafers under mild conditions. The single-chamber MOF-CVD process and the impact of the deposition parameters are elucidated via a combination of in situ monitoring and ex situ characterization. The resulting process guidelines will pave the way for new MOF-CVD formulations and a plethora of MOF-based devices.
dc.language.iso	eng
dc.relation.ispartof	Chemistry of Materials, 2019, vol. 31, num. 22, p. 9462-9471
dc.subject	Química organometàl·lica
dc.subject	Ciència dels materials
dc.subject	Òxids
dc.title	Integrated cleanroom process for the vapor-phase deposition of large-area zeolitic imidazolate framework thin films
dc.type	journal article	es_ES
dc.date.updated	2020-05-04T10:36:52Z
dc.identifier.doi	10.1021/acs.chemmater.9b03435
dc.identifier.idgrec	136198
dc.rights.accessRights	open access	es_ES