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Monolayer black phosphorus by sequential wet-chemical surface oxidation

Repositori DSpace/Manakin

Valencià Castellano

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IMPORTANT: Aquest repositori està en una versió antiga des del 3/12/2023. La nova instal.lació está en https://roderic.uv.es/

Monolayer black phosphorus by sequential wet-chemical surface oxidation

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Wild, Stefan; Lloret, Vicent; Vega-Mayoral, Victor; Vella, Daniele; Nuin, Edurne; Siebert, Martin; Koleśnik-Gray, Maria; Löffler, Mario; Mayrhofer, Karl J. J.; Gadermaier, Christoph; Krstić, Vojislav; Hauke, Frank; Abellán Sáez, Gonzalo; Hirsch, Andreas

Aquest document és un/a article, creat/da en: 2019

We report a straightforward chemical methodology for controlling the thickness of black phosphorus flakes down to the monolayer limit by layer-by-layer oxidation and thinning, using water as solubilizing agent. Moreover, the oxidation process can be stopped at will by two different passivation procedures, namely the non-covalent functionalization with perylene diimide chromophores, which prevents the photooxidation, or by using a protective ionic liquid layer. The obtained flakes preserve their electronic properties as demonstrated by fabricating a BP field-effect transistor (FET). This work paves the way for the preparation of BP devices with controlled thickness.

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